New Applications on Multi-Beam Mask Writers to Enable Mask-Making in 3nm and Beyond
Published in Proc. SPIE Photomask Technology, 2024
Publication on advanced mask-making technologies for 3nm semiconductor manufacturing and beyond.
citation: Ta Wei Ou, Wing Kwan Ho, Tung San Lai, Jeremy L. C. Lu, Alan C. L. Chen, Alexander Egl, Matthias Kühmayer, Florian Brenner, "New applications on multi-beam mask writers to enable mask-making in 3nm and beyond," Proc. SPIE 13216, Photomask Technology 2024, 132160F (26 November 2024); https://doi.org/10.1117/12.3034678
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