Real-Time Machine Learning-Based Multivariate Time Series Anomaly Detection Control System for Reticle Manufacturing

This patent describes a novel machine learning-based system for real-time anomaly detection in semiconductor reticle manufacturing processes, utilizing multivariate time series analysis.

citation: Tung San Lai, et al. (2022). "Real-Time Machine Learning-Based Multivariate Time Series Anomaly Detection Control System for Reticle Manufacturing." Patent pending.